Dr. Fackler has 8 years of experience in semiconductor processing and metrology including thin film and aesthetic coating fabrication and failure analysis. The wide array of applications that Dr. Fackler has worked on include metallization, magnetic random access memory, and photocatalytic conversion, among others. Beyond the semiconductor industry, Dr. Fackler has performed quality control and safety assessment of consumer electronics components, medical devices, and optical components.
Dr. Fackler’s expertise includes semiconductor processing such as thin film fabrication via magnetron sputtering, pulsed laser deposition, and reactive ion sputtering. Dr. Fackler has metrology experience characterizing thin films with a number of techniques including wavelength dispersive spectroscopy, scanning probe microscopy, X-ray absorption spectroscopy, and X-ray diffraction (grazing and wide-angle). He also has expertise in magnetometry including vibrating sample magnetometry and measurement of the magneto-optic Kerr effect.
After joining Exponent, Dr. Fackler has conducted failure analysis for clients in consumer electronics and the medical device industry and enjoys lecturing at the materials science and engineering department at Stanford University. As a postdoctoral fellow at the Lawrence Berkeley National Lab, Dr. Fackler screened oxynitride thin films using X-ray absorption spectroscopy to identify new oxygen evolution reaction catalysts. During his doctoral work at the University of Maryland he vetted a screening process for reproducibility and accuracy of discovering new magnetic thin films. Dr. Fackler also showed a novel way to observe the coupling of magnetism and strain using magnetic force microscopy and a specially designed magnetic film.
CREDENTIALS & PROFESSIONAL HONORS
- Ph.D., Materials Science and Engineering, University of Maryland, 2015
- B.S., Physics, The State University of New Jersey, 2009
Suram SK, Fackler SW, Zhou L, N’Diaye AT, Drisdell WS, Yano J, Gregoire JM. Combinatorial Discovery of Lanthanum–Tantalum Oxynitride Solar Light Absorbers with Dilute Nitrogen for Solar Fuel Applications. ACS Combinatorial Science 2018; 20(1):26–34. DOI: 10.1021/acscombsci.7b00143
Fackler S, Alexandrakis V, Koenig D, Kusne A, Gao T, Kramer M, Stasak D, Lopez K, Zayac B, Mehta A, Ludwig A, Takeuchi I. Combinatorial study of Fe-Co-V hard magnetic thin films. Science and Technology of Advanced Materials 2017.
Fackler S, Donahue MJ, Gao T, Nero PNA, Cheong S-W, Cumings J, Takeuchi I. Local control of magnetic anisotropy in transcritical permalloy thin films using ferroelectric BaTiO3 domains. Applied Physics Letters 2014; 105(21):212905.
Gao TR, Fang L, Fackler S, Maruyama S, Zhang XH, Wang LL, Rana T, Manchanda P, Kashyap A, Janicka K, Wysocki AL, N’Diaye AT, Arenholz E, Borchers JA, Kirby BJ, Maranville BB, Sun KW, Kramer MJ, Antropov VP, Johnson DD, Skomski R, Cui J, Takeuchi I. Large energy product enhancement in perpendicularly coupled MnBi/CoFe magnetic bilayers. Phys. Rev. B 2016; 94(6):060411.
Lee S, Zhang X, Liang Y, Fackler S, Yong J, Wang X, Paglione J, Greene RL, Takeuchi I. Observation of the superconducting proximity effect in the surface state of SmB6 thin films. Phys. Rev. X 2016;, 6(3):031031.
Unguris J, Bowden SR, Pierce DT, Trassin M, Ramesh R, Cheong S-W, Fackler S, Takeuchi I. Simultaneous imaging of the ferromagnetic and ferroelectric structure in multiferroic heterostructures. APL Materials 2014; 2(7):076109.
Gao T, Wu YQ, Fackler S, Kierzewski I, Zhang Y, Mehta A, Kramer MJ, Takeuchi I. Combinatorial exploration of rare-earth-free permanent magnets: Magnetic and microstructural properties of Fe-Co-W thin films. Applied Physics Letters 2013; 102 (2):022419-4.
Kui J, Suchoski R, Fackler S, Zhang Y, Pan X, Greene RL, Takeuchi I. Combinatorial search of superconductivity in Fe-B composition spreads. APL Materials 2013; 1(4): 042101.
Lee S, Kim W-K, Cho Y-C, Kim B-S, Park JH, Lee C-W, Lee Y, Lee S, Fackler S, Takeuchi I, Cho CR, Jeong S-Y. Hydrogen lithography for nanomagnetic domain on Co-doped ZnO using an anodic aluminum oxide template. Applied Physics Letters 2014; 104:052405.
Zhang X, Sushkov AB, Metting CJ, Fackler S, Drew HD, Briber RM. Silicon patterning using self-assembled PS-b-PAA diblock copolymer masks for black silicon fabrication via plasma etching. Plasma Processes and Polymers 2012; 9(10):968–974.
Cui J, Wu Y, Muehlbauer J, Hwang Y, Radermacher R, Fackler S, Wuttig M, Takeuchi I. Demonstration of high efficiency elastocaloric cooling with large ΔT using NiTi wires. Applied Physics Letters 2012; 101(7):073904.
Fackler S, Pandolfi R, Huck P, N’Daiye A, Yano J, Arenholz E, Hexemer A. Developing software for NEXAFS analysis and results dissemination. Invited Speaker, The Advanced Light Source User Meeting, Berkeley, CA, 2016.
Fackler S, Suram SK, Zhou L, N’Diaye AT, Drisdell W, Arenholz E, Gregoire JM, Yano J. High-throughput characterization of mixed anion photoanode materials using NEXAFS. Invited Speaker, International Materials Research Congress, Cancun, Mexico, 2016.
Fackler S, Gao T, Cheong S-W, Takeuchi I. Local control of magnetic anisotropy in permalloy thin films coupled to ferroelectric domains of BaTiO3 single crystals. Oral presentation. Magnetism and Magnetic Materials (MMM) Conference, Denver, CO, 2013.
Fackler S, Gao T, Cheong S-W, Takeuchi I. Local control of magnetic anisotropy in permalloy thin films coupled to ferroelectric domains of BaTiO3 single crystals. Poster presentation. Materials Research Society Fall Meeting & Exhibit, Boston, MA, 2012.
Postdoctoral Fellow, Lawrence Berkeley National Lab, 2016-2017
Lecturer, Material Science and Engineering, Stanford, 2019
Applied Physics Letters